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DC poleHodnotaJazyk
dc.contributor.authorKnápek, Alexandr
dc.contributor.authorKrcál, Ondřej
dc.contributor.authorGrmela, Lubomír
dc.contributor.editorPihera, Josef
dc.contributor.editorSteiner, František
dc.date.accessioned2012-10-30T12:53:55Z
dc.date.available2012-10-30T12:53:55Z
dc.date.issued2010
dc.identifier.citationElectroscope. 2010, č. 1.cs
dc.identifier.issn1802-4564
dc.identifier.urihttp://147.228.94.30/images/PDF/Rocnik2010/Cislo1_2010/r4c1c1.pdf
dc.identifier.urihttp://hdl.handle.net/11025/565
dc.format4 s.cs
dc.format.mimetypeapplication/pdf
dc.language.isoenen
dc.publisherZápadočeská univerzita v Plzni, Fakulta elektrotechnickács
dc.relation.ispartofseriesElectroscopecs
dc.rightsCopyright © 2007-2010 Electroscope. All Rights Reserved.en
dc.subjectmikroskopické katodycs
dc.subjectvýrobacs
dc.subjectdiagnostikacs
dc.subjectSchottkyho emisecs
dc.titleSchottky nano-tip cathodes fabrication and diagnosticsen
dc.typečlánekcs
dc.typearticleen
dc.rights.accessopenAccessen
dc.type.versionpublishedVersionen
dc.description.abstract-translatedThe paper deals with a method for fabrication and diagnostics of microscopic cathode based on Schottky field emission. Schottky emission is considered to be the predominant electron source technology in actual focused electron beam equipment. For the ideal electron source, it is necessary to achieve following properties: small source size, low electron emission energy spread, angular intensity (an emission current per unit solid angle), low noise, long-term stability and a simple and low-cost operation. Electrochemical etching procedure, used for producing extra-sharp tungsten cathode tips, together with suitable noise based analysis method are presented in his paper. All of the cathodes were fabricated primarily for further experiments connected with the electron microscopy purposes. Noise diagnostics was performed on the cathode, under the ultra high vacuum conditions (UHV) in order to avoid environment interaction with ions which are present in the vacuum chamber. The noise spectroscopy in time and frequency domain is one of the promising methods to provide a non-destructive characterization of semiconductor materials and devices.en
dc.subject.translatedmicroscopic cathodsen
dc.subject.translatedfabricationen
dc.subject.translateddiagnosticsen
dc.subject.translatedSchottky emissionen
dc.type.statusPeer-revieweden
Vyskytuje se v kolekcích:Číslo 1 (2010)
Číslo 1 (2010)

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  1. DSpace at University of West Bohemia
  2. Publikace ZČU / UWB Publications
  3. Časopisy ZČU / UWB Journals
  4. Electroscope
  5. Ročník 2010
  6. Číslo 1 (2010)