The aim of this thesis is to fabricate thermochromic thin film of vanadium oxide. High power impulse magnetron sputtering is used to prepare a thermochromic film with structure changes below transition temperature Tc = 68 °C providing variable transmittance in infrared spectrum. The...

HfB2-based thin layers are well known for its high hardness, low electrical resistivity and oxidation resistance. Due to these properties the films are useful in many industrial applications. This study is focused on oxidation resistance of Hf-Si-B-C-N thin films and its change caused&#...

This diploma thesis deals with the mechanical properties of nanocomposite thin films Al-Si-N (Al:Si = 90:10 hm. %) deposited by unbalanced magnetron sputtering, their resistance to cracking in bending test and indentation test with high load until 1 N. This work is mainly focused&#...

The presented diploma thesis is at the beginning focused on application of plasma technologies. Next, it explains basics of the pressure measurement and the magnetron sputtering, including the reactive deposition and its application. In the Methodology chapter development of the test task&#x...

The subject of this diploma thesis is the deposition of ZrCuN thin films, which were reactively sputtered in Ar + N2 mixture using unbalanced dual magnetron equipped with stacked targets composed of Zr disc attached by Cu ring with an inner diameter of in = 34 mm.&#x...

The subject of this paper was deposition thin Ti-Ni-N films, which were prepared by reactive magnetron sputtering with dual magnetron system. The influence of repetition frequency on the properties of deposited Ti-Ni-N films was investigated in series 1. The influence of substrate bias&...

This diploma thesis deals with thin films based on nitrides and borides of transition metals. The main attention was devoted to find the reason of high compressive stress in Hf-B-C-(N) materials compared to materials based on Zr and Ti prepared under the same discharge conditi...

This thesis is dedicated to the reactive magnetron sputtering Zr-Si-O coatings using ac pulse dual magnetron. Zr-Si-O coatings with various elemental composition ratios were deposited on silicon, glass and molybdenum substrates. The partial pressure of reactive gas oxygen pO2 on deposition&...

This thesis is aimed at reactive high-power impulsed magnetron deposition of densified stoichiometric HfO2 thin films with pulse control of reactive gas flow. Thin films were prepared in oxygen and argon atmosphere, at pressure of working gas 2 Pa. A hafnium target of 100 mm&#...

This thesis is focused on multicomponent Hf-Si-B-C and Hf-Si-B-C-N thin films preparation by pulsed magnetron sputtering. The elemental composition, structure, mechanical, electrical properties and oxidation resistance of deposited films were subsequently evaluated. The main aim was to find the correl...

This thesis is focused on ab-initio simulations of binary, ternary and selected quaternary transition metal nitrides of IV B a V B groups (Ti, Zr, Hf, V, Nb, Ta). In particular, formation energies, electronic structures and elastic properties were calculated. Results obtained for b...

This paper reports on carbon coatings and carbon-nitride (CNx) coatings deposited by reactive magnetron sputtering in argon-nitrogen atmosphere onto Si(100) substrates. The effect of subtrate temperature Ts and gas composition on structural, mechanical and tribological properties of sputtered coatings ...